High resolution determination of the stress in individual interconnect lines and the variation due to electromigration
Publication information:
55, Q. Ma, S. Chiras, D.R. Clarke, and Z. Suo. 1995. “High Resolution Determination of the Stress in Individual Interconnect Lines and the Variation Due to Electromigration”. J. Appl. Phys., 78, Pp. 1614-22